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Patterned wafer/glass for TEG
Base | Φ6~Φ12inch Silicon wafer, Glass wafer |
Process | Oxidizing, Sputtering, Photolithography, Etching, CVD, PVD, Plating, Ball mounting, Printing |
Qty. | a small quantity~ |
Remarks | Patterning, plating and ball mounting on glass wafer are also possible. |
Patterned test kit for TEG
Base | Rigid test kit for TEG, Strip test kit, Flexible printed circuits, other |
Process | Multilayer test kit, buildup test kit, etc. |
Qty. | a small quantity~ |
Remarks | - |
Base | WALTS TEG chip, customer's product, chip with Al film, etc. |
Experience | WALTS TEG with 50um pitch, pad opening 40um |
Qty. | a small quantity~ |
Remarks | - |
Base | Φ6~Φ12inch, WALTS TEG , Mirror wafers, |
Backgrinding | Stress relief after backgrinding |
Experience | Φ8inch mirror wafer: t=25um Φ8inch TEG with ball mounted : t=50um |
Remarks | Handling with wafer ring and protoss carrier for ultra thin backgrinding wafer. |
Base | Φ6~Φ12inch, WALTS TEG, Mirror wafers, Glass |
Qty. | a small quantity~ |
Experience | Φ8inch mirror wafer: □0.25mm |
Remarks | - |
Size | Φ4~Φ12 |
Type | Prime wafers, Monitor wafers, etc. |
Qty. | a small quantity~ |
Remarks | Asslice wafers are also available |
Size | Φ6、Φ8 |
Type | Tempax, etc. |
Qty. | a small quantity~ |
Remarks | Multi layer is also possible (ex. : Si/SiO2(3000)/Ta(3000Å) |
Size | Φ8 |
Type | Al, AlCu, Ta, Ti, Au, Pt, Au, Cu, etc. |
Qty. | a small quantity~ |
Remarks | Multi layer is also possible (ex. : Si/SiO2(3000)/Ta(3000Å) |
Size | Φ8 |
Type | Polyimide, Low-K, PBO, BCB, ITO, etc. |
Qty. | a small quantity~ |
Remarks | Laminate is also possible (ex. :Si/TEOS (3000Å) PI(4um)) |
Fukuoka System LSI Center #608, 3-8-33 Momochihama, Sawara-Ku, Fukuoka-shi, Fukuoka, 814-0001 JAPAN
TEL +81-92-405-8711